4.3.3.14. NXebeam_column¶
Status:
base class, extends NXobject
Description:
Container for components to form a controlled electron beam.
Symbols:
No symbol table
- Groups cited:
NXaperture_em, NXbeam, NXcorrector_cs, NXlens_em, NXmanufacturer, NXsensor, NXsource, NXstage_lab, NXtransformations
Structure:
MANUFACTURER: (optional) NXmanufacturer
electron_gun: (optional) NXsource
The source which creates the electron beam.
name: (optional) NX_CHAR
Given name/alias.
voltage: (optional) NX_FLOAT {units=NX_VOLTAGE}
Voltage relevant to compute the energy of the electrons immediately after they left the gun.
probe: (optional) NX_CHAR
Type of radiation.
Obligatory value:
electronemitter_type: (optional) NX_CHAR
Emitter type used to create the beam.
If the emitter type is other, give further details in the description field.
Any of these values:
filament
schottky
cold_cathode_field_emitter
otheremitter_material: (optional) NX_CHAR
Material of which the emitter is build, e.g. the filament material.
description: (optional) NX_CHAR
Ideally, a (globally) unique persistent identifier, link, or text to a resource which gives further details.
MANUFACTURER: (optional) NXmanufacturer
TRANSFORMATIONS: (optional) NXtransformations
Affine transformation which detail the arrangement in the microscope relative to the optical axis and beam path.
APERTURE_EM: (optional) NXaperture_em
LENS_EM: (optional) NXlens_em
CORRECTOR_CS: (optional) NXcorrector_cs
STAGE_LAB: (optional) NXstage_lab
SENSOR: (optional) NXsensor
A sensor used to monitor an external or internal condition.
BEAM: (optional) NXbeam
Individual ocharacterization results for the position, shape, and characteristics of the electron beam.
NXtransformations should be used to specify the location of the position at which the beam was probed.
Hypertext Anchors¶
List of hypertext anchors for all groups, fields, attributes, and links defined in this class.